A new development in the use of osmium in electron microscopy will enable scientists to avoid covering up important structure.

According to Laboratory Talk, SPI Supplies in Japan is now distributing osmium plasma coaters, developed and manufactured by Filgen.

The new technology allows for fine structureless and featureless thin film coatings to be deposited on surfaces which are used in electron microscopy and will be especially useful for those using a Fesem.

Through a process using the concepts of PVD, the osmium coating enables the creation of a conductive layer at a thickness of just under one nanometre.

This is compared to a thickness of 20 nanometres for chromium and around 300 nanometres for gold, platinum and palladium.

The reduced size and different coating technique means that an electrically conductive coating can be applied without covering up important structure, something which is not possible with the other methods.

It is also claimed that servicing an osmium plasma coater is easier in practice than that of a typical electron microscope.


Ÿ Adfero Ltd